Electrical properties and energy band alignment of SiO/GaN metal-oxide-semiconductor structures fabricated on N-polar GaN(000) substrates

Mizobata, Hidetoshi*; Tomigahara, Kazuki*; Nozaki, Mikito*; Kobayashi, Takuma*; Yoshigoe, Akitaka; Hosoi, Takuji*; Shimura, Takayoshi*; Watanabe, Heiji*

Applied Physics Letters, 121(6), p.062104_1 - 062104_6, 2022/08

https://doi.org/10.1063/5.0095468

The interface properties and energy band alignment of SiO/GaN metal-oxide-semiconductor (MOS) structures fabricated on N-polar GaN(000) substrates were investigated by electrical measurements and synchrotron-radiation X-ray photoelectron spectroscopy. They were then compared with those of SiO/GaN MOS structures on Ga-polar GaN(0001). Although the SiO/GaN(000) structure was found to be more thermally unstable than that on the GaN(0001) substrate, excellent electrical properties were obtained for the SiO/GaN(000) structure by optimizing conditions for post-deposition annealing. However, the conduction band offset for SiO/GaN(000) was smaller than that for SiO/GaN(0001), leading to increased gate leakage current. Therefore, caution is needed when using N-polar GaN(000) substrates for MOS device fabrication.

Gamma irradiation effects of image sensor for radiation-resistant camera

Takeuchi, Tomoaki; Otsuka, Noriaki; Tsuchiya, Kunihiko; Tanaka, Shigeo*; Ozawa, Osamu*; Komanome, Hirohisa*; Watanabe, Takashi*; Ueno, Shunji*

Nihon Hozen Gakkai Dai-13-Kai Gakujutsu Koenkai Yoshishu, p.391 - 394, 2016/07

no abstracts in English

Effect of humidity and temperature on the radiation response of SiC MOSFETs

Takeyama, Akinori; Matsuda, Takuma; Yokoseki, Takashi; Mitomo, Satoshi; Murata, Koichi; Makino, Takahiro; Onoda, Shinobu; Tanaka, Yuki*; Kandori, Mikio*; Yoshie, Toru*; et al.

Proceedings of 11th International Workshop on Radiation Effects on Semiconductor Devices for Space Applications (RASEDA-11) (Internet), p.134 - 137, 2015/11

Change in the electrical characteristics of p-channel 6H-SiC MOSFETs by -ray irradiation

Oshima, Takeshi; Ito, Hisayoshi

Proceedings of the 6th International Workshop on Radiation Effects on Semiconductor Devices for Space Application (RASEDA-6), p.191 - 194, 2004/10

no abstracts in English

Research of single-event burnout in bipolar transistors

Hirao, Toshio; Shindo, Hiroyuki*; Kuboyama, Satoshi*; Nagai, Yuki*; Ohira, Hideharu*; Ito, Hisayoshi; Matsuda, Sumio*

JNC TN7200 2001-001, p.66 - 68, 2002/01

no abstracts in English

Mechanism for single-event burnout of bipolar transistors

Kuboyama, Satoshi*; Suzuki, Takahiro*; Hirao, Toshio; Matsuda, Sumio*

IEEE Transactions on Nuclear Science, 47(6), p.2634 - 2639, 2000/12

https://doi.org/10.1109/23.903819

no abstracts in English

Influence of post-oxidation annealing on electrical characteristics in 6H-SiC MOSFETs

Oshima, Takeshi; Yoshikawa, Masahito; Ito, Hisayoshi; Kojima, Kazutoshi; Okada, Sohei; Nashiyama, Isamu

Materials Science Forum, 338-342, p.1299 - 1302, 2000/00

no abstracts in English

Irradiation effect of transistor by Co-60 gamma ray and electron beam; Effects of dose rate and exposure temperatures

Hirao, Toshio; Yoshikawa, Masahito; Morita, Yosuke; *; *

JAERI-M 89-207, 128 Pages, 1989/12

JAERI-M-89-207.pdf:2.62MB

no abstracts in English

Transistorization in reactor instrumentation

Nihon Genshiryoku Gakkai-Shi, 6(8), P. 471, 1964/00

no abstracts in English

Electrical properties of SiC MOSFETs irradiated with -rays at elevated temperature

Matsuda, Takuma; Yokoseki, Takashi; Mitomo, Satoshi; Murata, Koichi; Makino, Takahiro; Takeyama, Akinori; Onoda, Shinobu; Okubo, Shuichi*; Tanaka, Yuki*; Kandori, Mikio*; et al.

no journal, , 

Silicon carbide (SiC) is expected to be applied to Metal-Oxide-Semiconductor (MOS) FETs used in harsh radiation environments to decommission TEPCO Fukushima Daiichi nuclear reactors. To develop radiation resistant SiC MOS FETs, clarification of their radiation response under elevated temperature is required. We measured capacitance-voltage (C-V) characteristics of SiC MOSFETs irradiated with -rays at 423 K in nitrogen atmosphere. The samples were vertical power 4H-SiC MOSFETs with the blocking voltage of 1200 V and the rated current of 20 A with the gate oxide thickness of 45 nm. Typical C-V curve of a SiC MOSFET irradiated even up to 5 kGy was shifted to negative voltage side, suggesting that the positive charges generated in gate oxide by irradiation. While, no significant change in the slope of the curve was observed, indicating that interface traps between the gate oxide and SiC were merely generated. The radiation response of SiC MOS FETs under elevated temperature predominantly depends on the amount of positive charges generated in the gate oxide.